Plasma parameters analysis in DC and RF magnetron sputtering using finite element method

Calderón N.Z.; Becerra C.; Campo J.; Carrreño J.; Torreblanca H.; Stüber M.; Ulrich S.; Grieseler R. · Physica Scripta (2025) · DOI: 10.1088/1402-4896/ae0c48

Resumen

A comprehensive comparison of results obtained by finite element modelling (FEM) and plasma diagnostics between direct current (d.c.) and radio frequency (RF) magnetron sputtering at a frequency of 13.56 MHz is presented. This research studies the influence of power in the range 20 W to 90 W at a constant argon gas pressure of 1 Pa. The maximum plasma density values are observed at 90 W in the d.c. mode, reaching 1.41 × 1017 m−3, and 1.95 × 1016 m−3 in the RF mode, with results obtained within 1μs after ignition of the plasma. The results of the experiments showed that the plasma concentration at a distance of 23 mm from the cathode has maximum values; indicating that the electron and ion density values increase as the d.c. and RF magnetron sputtering power increases. This research aims to demonstrate the different charge density values obtained in RF and d.c. plasma with FEM to facilitate the prediction of the magnetron sputtering discharge parameters of the MatER PUCP laboratory. Given that at this moment suitable models for RF sputtering are rather scarce, the obtained plasma parameters from FEM will be compared to plasma parameters that were obtained experimentally.

Instituciones: Pontificia Universidad Católica del Perú; Universidad Nacional de Ingeniería