Interferograms analysis for measuring the thickness of aluminum thin films

Choque I.; Asmad M.; Miranda J.; Quispe A. · Proceedings of SPIE - The International Society for Optical Engineering (2023) · DOI: 10.1117/12.2672620

Resumen

In this work, a specific procedure to measure the thickness of aluminum thin films by interferogram analysis is described. Six interferograms correspond to the image of the aluminum thin film superimposed with interference fringes are obtained from a Michelson-type interferential microscope. A six-frame phase shift algorithm is used to demodulate the optical phase. The measured phase is proportional to the height variation between the thin film wafer and the substrate. Finally, the obtained 3D height map permits us measure the thickness of the sample over an area of 1024 µm × 1280 µm.

Instituciones: Pontificia Universidad Católica del Perú; Universidad Nacional Jorge Basadre Grohmann