Influence of growth temperature on interface diffusion and magnetic properties of Ni-Mn-Sn-Pd thin films

Pinedo-Cuba M.G.; Rueda-Vellasmín R.; Quispe-Marcatoma J.; Landauro C.V.; Nascimento V.P.; Checca-Huamán N.R.; Peña-Rodríguez V.A.; Passamani E.C. · Thin Solid Films (2026) · DOI: 10.1016/j.tsf.2025.140843

Resumen

In thin film growth, temperature is a key parameter that typically improves crystal quality. However, the temperature also promotes diffusion in the film-substrate interface. The present study investigated the effect of the substrate temperature (TS[jls-end-space/]) on the crystal ordering and magnetic properties of Ni-Mn-Sn-Pd pseudo-Heusler alloy thin films. Different chemical orderings were gradually observed in the films as a result of varying TS[jls-end-space/], with the following sequence: a dominant cubic A2-type structure found in the film prepared at 300 K, a presence of B32a-type structure in the film deposited at 673 K, and a mixture of B2 and (Formula presented) structures in the film produced at 873 K. Besides the enhancement of atomic ordering with rising TS[jls-end-space/], an increase in the grain size of the cubic phases was also noted, both factors directly contributing to the observed improvements in the magnetic properties of the Ni-Mn-Sn-Pd films. All the films showed a magneto-structural phase transition at approximately (Formula presented) regardless of the TS value. It was also shown that at (Formula presented), Ni atoms diffused into the Si substrate up to 27 nm, passing through buffer layers, i.e., Pt and natural SiO2. This study demonstrates that the highest Ts favoured significant improvements on magneto-structural properties, but also promotes an undesired strong diffusion of Ni into the Si substrates.

Instituciones: Universidad Nacional Mayor de San Marcos